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NANO PRO Carbon (Graphite) Sputtering Target C

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TA1401
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NANO PRO Carbon (Graphite) Sputtering Target C

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Global Head Office

Email: Marknanossr@gmail.com

Tel：+86 15606950920

Wechat: 15606950920

Address:  Building 1, No. 39 Xinchang Road, Haicang District, Xiamen City, Fujian Province, China

Both standard and custom-made high purity (>99.99%, trace metal basis) carbon (graphite) sputtering targets are available.

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

Typical specifications of graphite blocks

Density: 1.8 g/cm3
Electrical resistivity: 15 uOhm.m
Impurity: Porosity: 20%
Hardness HSD: 40
Bending strength: 40 MPa
Compressive strength: 60 MPa

Carbon (Graphite) (C) Properties

Material Type Carbon
Symbol C
Atomic Weight 12.0107
Purity (%) >99.99 (trace metal basis)
Color/Appearance Black, Non-Metallic
Thermal Conductivity 140 W/m.K
Melting Point (°C) ~3,652
Coefficient of Thermal Expansion 7.1 x 10-6/K
Theoretical Density (g/cm3) 2.25
Z Ratio 3.26
Sputter PDC
Max Power Density
(Watts/Square Inch)		 80
Type of Bond Indium Bonding
Comments E-beam preferred. Arc evaporation. Poor film adhesion.
Available Products
Pure Carbon
Name Purity

Carbon (Graphite)

Sizes and Shapes can be custom made

C

>99.99% (trace metal basis)
Carbon Alloys
Name Composition

Aluminum Titanium Carbon Alloy

AlTiC Alloy

5% Ti - 0.2% C

Aluminum Titanium Carbon Alloy

AlTiC Alloy

3% Ti - 0.2% C

Aluminum Titanium Carbon Alloy

AlTiC Alloy

3% Ti - 0.15% C
Carbon Compounds

Name

Formula

Boron Carbide

B4C

Chromium Carbide

Cr3C2

Chromium Carbonitride

CrCN

Hafnium Carbide

HfC

Molybdenum Carbide

Mo2C

Niobium Carbide

NbC

Silicon Carbide

SiC

Tantalum Carbide

TaC

Titanium Carbide

TiC

Titanium Carbonitride

TiCN

Tungsten Carbide

WC

Tungsten Carbide

W2C

Tungsten Carbide - Cobalt

WC - 6 wt. % Co

Tungsten Carbide - Cobalt

W2C - 12 wt. % Co

Vanadium Carbide

VC

Zirconium Carbide

ZrC

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