Zinc Oxide doped with Gallium Oxide (ZnO/Ga2O3, GZO) 95/05 wt% Sputtering Target
To add a Cu Backing Plate with Indium Bonding for Sputtering Targets
Product SKU: |
TA8400 |
CAS#: |
52934-06-2 |
Molar Mass: |
NA g/mol |
Density: |
NA g/cm3 |
Melting Point: |
NA °C |
Purity: |
99.9%, Higher purities available upon request |
Dopant Ratio: |
95/05 wt%, Other dopant levels available upon request |
Shape: |
Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made |
Dimension: |
Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made |
NANOSSR is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers.